Small PVD Thin Film Deposition Coating Machine System For Metals And Organics

Sales Manager: Gia

Email: Gia@tmaxlaboratory.com

Wechat: Dingqiuna

Item No.:
TMAX-PD-ZD01
Payment:
L/C, T/T, Western Union, Credit Cards, Paypal
Shipping port:
Xiamen Port
Lead Time:
5 Days
Certificate:
CE, IOS, ROHS, SGS, UL Certificate
Warranty:
Two years limited warranty with lifetime technical support

Product Details

Small PVD Thin Film Deposition Coating Machine System For Metals And Organics

TMAX-PD-ZD01-High-Vacuum Evaporation Coating System

Product Overview

This system is a compact, multi-source high-vacuum evaporation coating platform designed for laboratory use, capable of depositing thin films of metals, organics, and other functional materials. It is ideal for:

· Research labs (metal electrode fabrication, SEM sample preparation).

· Advanced materials development (organic thin films).

· Process optimization (high-precision coatings for novel material synthesis).

Key Advantages vs. Competing Systems

Feature	This System	Typical Competing Systems
Vacuum Speed	15–20 min to high vacuum (≤5×10⁻⁵ Pa)	Often 30+ min for similar vacuum levels.
Film Uniformity	±3%–5% thickness deviation	Typically ±5%–10% in entry-level models.
Chamber Material	304 stainless steel (high corrosion resistance)	Some use aluminum or lower-grade steel.
Modularity	Supports 1–3 evaporation sources (expandable)	Fixed configurations common in low-end systems.
Footprint	Compact (500×360×420mm for desktop model)	Larger benchtop units often >600×500mm.

Technical Specifications

Parameter	Specification
Vacuum Chamber	304 stainless steel, cylindrical (Φ260×H350 mm)
Internal Coating Area	~Φ260×H310 mm
Ultimate Vacuum	≤5×10⁻⁵ Pa
Pumping Speed	≤8×10⁻⁴ Pa in 30 min, holds ≤5 Pa for 12 hours
Substrate Stage	- Max size: 80×80 mm (standard) / 120 mm diameter (rotary) - Rotation: 0–20 RPM (magnetic fluid sealed)
Film Uniformity	<5% (120 mm diameter area)
Evaporation Sources	2–3 sources (metal/organic compatible, co-evaporation or switching)
Power Supply	2 kW, constant current/power modes
Electrical	AC 220 V / 50 Hz, 3.5 kW
Dimensions (L×W×H)	- Main unit: 600×500×900 mm - Desktop model: 500×360×420 mm

Why This System Stands Out?

1. Speed & Efficiency

o Achieves high vacuum 50% faster than comparable models, reducing idle time.

2. Precision Engineering

o Stainless steel chamber + optimized gas paths ensure minimal contamination and long-term stability.

3. Flexible Configurations

o Modular design allows easy upgrades (e.g., adding a third evaporation source).

4. Space-Saving

o 30% smaller footprint than conventional systems, critical for crowded labs.

Ideal For:

✔ Universities studying thin-film physics.
✔ R&D centers developing flexible electronics or OLEDs.
✔ Industrial labs requiring high-repeatability coatings.

Order Note: Minimum 1 unit. Custom configurations available.

PVD Deposition

1 Standard exported package: Internal anticollision protection, external export wooden box packaging.

2 Shipping by express, by air, by sea according to customers' requirements to find the most suitable way.

3 Responsible for the damage during the shipping process, will change the damage part for you for free.

Hot Tags :

PVD Film Deposition Small PVD Machine PVD Deposition System Metal PVD Deposition Organic Deposition Organic Film Deposition

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