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Item No.:
Lith-BY-ZD02Payment:
L/C, T/T, Western Union, Credit Cards, PaypalShipping port:
Xiamen PortLead Time:
5 DaysCertificate:
CE, IOS, ROHS, SGS, UL CertificateWarranty:
Two years limited warranty with lifetime technical supportDesktop Pulsing Thermal Evaporation Carbon Metal Deposition Coater PVD System Equipment
Model: TMAX-BY-ZD02-Pulsing Thermal Evaporation Carbon Coater
The Lith-BY-ZD02 Pulsing Thermal Evaporation Carbon Coater is an advanced deposition system designed for ultra-thin carbon film coating in SEM, TEM, and EBSD applications. Utilizing resistive heating of high-purity carbon rope, it enables precise, fast, and contamination-free carbon film deposition with adjustable parameters for optimized coating quality.
✔ Dual Deposition Modes – Supports Flash & Pulsed evaporation (0-9 pulses) for controlled, low-debris coating.
✔ Touchscreen Control – User-friendly interface for precise current/pulse adjustment.
✔ Adjustable Evaporation Current (50A-80A) – Prevents sample damage while ensuring uniform coating.
✔ Vacuum Protection System – Safeguards against low-vacuum short circuits.
✔ Compact & Efficient – Optimized for lab environments with rapid pump-down (<5 min).
|
Category |
Specification |
|
Model |
Lith-BY-ZD02 |
|
Dimensions (W×D×H) |
390mm × 310mm × 290mm |
|
Chamber Material |
Borosilicate Glass (Ø160mm × 110mm H) |
|
Sample Stage |
50mm (Diameter) |
|
Evaporation Source |
High-Purity Carbon Rope |
|
Deposition Modes |
Flash / Pulsed (0-9 pulses programmable) |
|
Max Evaporation Current |
80A |
|
Operating Vacuum |
4–6 Pa |
|
Ultimate Vacuum |
5 Pa |
|
Pump Type |
2-Stage Rotary Pump (VRD-8, 8 m³/h @50Hz) |
|
Power Supply |
220V AC, 50Hz |
|
Power Consumption |
1.6 kW |
|
Weight |
~50 kg |
· Pumping Speed:
o 50Hz: 8 m³/h (2.2 L/s)
o 60Hz: 9.6 m³/h (2.6 L/s)
· Time to Reach Vacuum: <5 minutes (to 2 Pa)
· Vacuum Measurement Range: Atmosphere to 2×10⁻² mbar
· High-Resolution SEM/TEM – Minimizes charging effects.
· EBSD Analysis – Enhances electron backscatter diffraction signals.
· X-ray Microanalysis – Provides conductive layers with minimal interference.
· Reduces Debris: Short pulses limit carbon splashing for cleaner coatings.
· Controlled Thickness: Programmable pulses (0-9) enable repeatable deposition.
· Touchscreen Interface: Intuitive control for current/pulse adjustment.
· No Process Gas Required: Simplified operation compared to sputtering systems.

1 Standard exported package: Internal anticollision protection, external export wooden box packaging.
2 Shipping by express, by air, by sea according to customers' requirements to find the most suitable way.
3 Responsible for the damage during the shipping process, will change the damage part for you for free.

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