Join TMAX, become an agent!
Sales Manager: Gia
Email: Gia@tmaxlaboratory.com
Wechat: Dingqiuna
Item No.:
TMAX-PC-JS03Payment:
L/C, T/T, Western Union, Credit Cards, PaypalShipping port:
Xiamen PortLead Time:
5 DaysCertificate:
CE, IOS, ROHS, SGS, UL CertificateWarranty:
Two years limited warranty with lifetime technical supportDC/RF Nano High-Precision Sputtering Coater Film Deposition System With Rotatable Triple-targets
Model: TMAX-PC-JS03-Rotatable Triple-targets
|
Category |
Parameter |
Value/Description |
|
Chamber Structure |
Design |
Vertical front-loading, stainless steel |
|
|
Sample Access |
Easy loading/unloading |
|
Vacuum Performance |
Base Pressure |
≤5×10−5 Pa |
|
|
Leak Rate |
≤5×10−7 Pa·L/s |
|
|
Pressure Rise Rate (12h) |
≤10 Pa |
|
|
Pumping System |
Domestic molecular pump + mechanical pump |
|
Targets & Power Supplies |
Target Quantity & Size |
3 × 2-inch magnetron targets (HV compatible) |
|
|
Target Types |
1 × Standard magnetic field, 1 × Strong magnetic field |
|
|
Target-Substrate Distance (Multilayer) |
40–120 mm |
|
|
Target-Substrate Distance (Ion Source) |
80–120 mm |
|
|
RF Power Supply |
1 × 1000 W, 13.56 MHz (auto-matching) |
|
|
DC Power Supply |
2 × 1000 W |
|
Substrate Holder |
Capacity |
Up to 3 substrates |
|
|
Rotation Speed |
5–30 RPM (self-rotation + planetary) |
|
|
Heating Range |
Programmable up to 450°C |
|
|
Bias Voltage |
Supports up to 1000 V |
|
Gas Control System |
Gas Lines |
2 independent MKS mass flow controllers (Ar + reactive gas) |
|
|
Features |
Gas mixing, adjustable/measurable chamber pressure |
|
Additional Features |
Chamber Baking |
Infrared heating (150°C) |
|
|
Liner Plate |
Prevents chamber contamination |
|
|
Safety Protections |
Water/power failure interlock, anti-misoperation protection |
· Supports DC/RF sputtering for metals, semiconductors, and insulators.
· Triple-target design enables sequential multilayer deposition without vacuum breaks.
· Programmable substrate heating (±450°C) with adjustable ramp rates.
· Rotation mechanism (5–30 RPM) ensures uniform film thickness.
· Ideal for nanoscale functional films (e.g., optoelectronics, tribological coatings).
· Reverse sputtering cleaning enhances film adhesion and purity.
· Manual controls for target shutters, rotation, and temperature.
· Safety systems mitigate operational risks (e.g., interlock protections).
· Academic & Government Labs: Thin-film material R&D.
· Industrial Prototyping: Small-scale production of specialized coatings.
1 Standard exported package: Internal anticollision protection, external export wooden box packaging.
2 Shipping by express, by air, by sea according to customers' requirements to find the most suitable way.
3 Responsible for the damage during the shipping process, will change the damage part for you for free.

Previous :
Lab Desktop Magnetron Sputtering Coating Metal Machine System For Thin-Film FabricationNext :
Versatile High Vacuum Magnetron Sputtering System With Multi-target For Compound Multilayer Films DepositionCategories
© Copyright: 2025 Xiamen Tmax Battery Equipments Limited All Rights Reserved.
IPv6 network supported